Multiscale Modeling in Epitaxial Growth (International Series of Numerical Mathematics)
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Multiscale Modeling in Epitaxial Growth (International Series of Numerical Mathematics) (2005)
~EN HC USISBN: 9783764372088 bzw. 3764372087, vermutlich in Englisch, Birkhäuser, gebundenes Buch, gebraucht, guter Zustand.
Lieferung aus: Irland, Versandkosten nach: DEU.
Von Händler/Antiquariat, killarneybooks.
Birkhäuser, 2005. Hardcover. Good. Hardcover, viii + 237 pages, NOT ex-library. Very good interior, clean, with unmarked text, free of inscriptions and stamps, firmly bound. Boards show small indentations to edges. Issued without a dust jacket. -- Contents: 1. Atomistic Models: -- Lattice Gas Models and Kinetic Monte Carlo Simulations of Epitaxial Growth / Michael Biehl; Cluster Diffusion and Island Formation on fcc(111) Metal Surfaces Studied by Atomic Scale Computer Simulations / Karsten Albe, Michael Müller; A Multiscale Study of the Epitaxial CVD of Si from Chlorosilanes / Carlo Cavallotti; Off-lattice Kinetic Monte Carlo Simulations of Strained Heteroepitaxial Growth / Michael Biehl; Quasicontinuum Monte Carlo Simulation of Multilayer Surface Growth / Jason P. DeVita; 2. Step Flow Models: -- Introduction to Step Dynamics and Step Instabilities / Joachim Krug; A Finite Element Framework for Burton-Cabrera-Frank Equation / Frank Haußer, Axel Voigt; Edge Diffusion in Phase-Field Models for Epitaxial Growth / Andreas Rätz, Axel Voigt; Discretisation and Numerical Tests of a Diffuse-Interface Model with Ehrlich-Schwoebel Barrier / Felix Otto; Islands in the Stream: Electromigration-Driven Shape Evolution with Crystal Anisotropy / Philipp Kuhn, Joachim Krug; Simulation of Ostwald Ripening in Homoepitaxy / Frank Haußer, Axel Voigt; 3. Continuum Models: -- Continuum Models for Surface Growth / Martin Rost; Configurational Continuum Modelling of Crystalline Surface Evolution / Navot Israeli, Daniel Kandel; On Level Set Formulations for Anisotropic Mean Curvature Flow and Surface Diffusion / Ulrich Clarenz -- Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists.
Von Händler/Antiquariat, killarneybooks.
Birkhäuser, 2005. Hardcover. Good. Hardcover, viii + 237 pages, NOT ex-library. Very good interior, clean, with unmarked text, free of inscriptions and stamps, firmly bound. Boards show small indentations to edges. Issued without a dust jacket. -- Contents: 1. Atomistic Models: -- Lattice Gas Models and Kinetic Monte Carlo Simulations of Epitaxial Growth / Michael Biehl; Cluster Diffusion and Island Formation on fcc(111) Metal Surfaces Studied by Atomic Scale Computer Simulations / Karsten Albe, Michael Müller; A Multiscale Study of the Epitaxial CVD of Si from Chlorosilanes / Carlo Cavallotti; Off-lattice Kinetic Monte Carlo Simulations of Strained Heteroepitaxial Growth / Michael Biehl; Quasicontinuum Monte Carlo Simulation of Multilayer Surface Growth / Jason P. DeVita; 2. Step Flow Models: -- Introduction to Step Dynamics and Step Instabilities / Joachim Krug; A Finite Element Framework for Burton-Cabrera-Frank Equation / Frank Haußer, Axel Voigt; Edge Diffusion in Phase-Field Models for Epitaxial Growth / Andreas Rätz, Axel Voigt; Discretisation and Numerical Tests of a Diffuse-Interface Model with Ehrlich-Schwoebel Barrier / Felix Otto; Islands in the Stream: Electromigration-Driven Shape Evolution with Crystal Anisotropy / Philipp Kuhn, Joachim Krug; Simulation of Ostwald Ripening in Homoepitaxy / Frank Haußer, Axel Voigt; 3. Continuum Models: -- Continuum Models for Surface Growth / Martin Rost; Configurational Continuum Modelling of Crystalline Surface Evolution / Navot Israeli, Daniel Kandel; On Level Set Formulations for Anisotropic Mean Curvature Flow and Surface Diffusion / Ulrich Clarenz -- Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists.
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Multiscale Modeling in Epitaxial Growth
~EN HC NWISBN: 9783764372088 bzw. 3764372087, vermutlich in Englisch, Springer Shop, gebundenes Buch, neu.
Lieferung aus: Österreich, Lagernd.
Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists. Hard cover.
Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth process offer the possibility to link atomistic effects at the surface to the macroscopic morphology of the film. The goal of this book is to summarize recent developments in this field, with emphasis on multiscale approaches and numerical methods. It covers atomistic, step-flow, and continuum models and provides a compact overview of these approaches. It also serves as an introduction into this highly active interdisciplinary field of research for applied mathematicians, theoretical physicists and computational materials scientists. Hard cover.
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Multiscale Modeling In Epitaxial Growth (2005)
DE HC NW FEISBN: 9783764372088 bzw. 3764372087, in Deutsch, Birkhauser, gebundenes Buch, neu, Erstausgabe.
Von Händler/Antiquariat, Revaluation Books [2134736], Exeter, DEV, United Kingdom.
1st edition. 237 pages. 9.00x6.50x0.50 inches. In Stock.
1st edition. 237 pages. 9.00x6.50x0.50 inches. In Stock.
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Multiscale Modeling In Epitaxial Growth (international Series Of Numerical Mathematics) (2005)
DE HC US FEISBN: 9783764372088 bzw. 3764372087, in Deutsch, Birkenhäuser Verlag, Basel/Boston/Stuttgart, Schweiz, gebundenes Buch, gebraucht, Erstausgabe.
Von Händler/Antiquariat, Delhi Book Store [52238351], new delhi, Del, India.
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