Ion Implantation in Semiconductors, Science and Technology
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Ion Impantation in Semiconductors : Science and Technology (1975)
EN HC US
ISBN: 9780306308413 bzw. 030630841X, in Englisch, Plenum Press, gebundenes Buch, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, Versandkosten nach: USA.
Von Händler/Antiquariat, A Squared Books.
New York and London: Plenum Press. Hardcover. New York and London; 1975. Blue cloth covered boards with gold spine titles; mild edge wear; jacket has mild wear, with a few small tears along edges; 4to - over 9 3/4" - 12" Tall; Ex library with typical stamps and markings; Interior clean and unmarked; 742 pages. ISBN: 030630841X. Additional shipping charges may be requested for International or expedited orders. . Good. 1975.
Von Händler/Antiquariat, A Squared Books.
New York and London: Plenum Press. Hardcover. New York and London; 1975. Blue cloth covered boards with gold spine titles; mild edge wear; jacket has mild wear, with a few small tears along edges; 4to - over 9 3/4" - 12" Tall; Ex library with typical stamps and markings; Interior clean and unmarked; 742 pages. ISBN: 030630841X. Additional shipping charges may be requested for International or expedited orders. . Good. 1975.
2
Ion Implantation in Semiconductors, Science and Technology (1975)
EN HC NW
ISBN: 9780306308413 bzw. 030630841X, in Englisch, Plenum Publishing Corporation, gebundenes Buch, neu.
Lieferung aus: Niederlande, Vermoedelijk 4-6 weken.
bol.com.
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third confer... The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974. A huge number of papers had been submitted to this conference. All papers which were presented at the Fourth International Conference on Ion Implantation in Semiconductors and Other Materials are included in this proceedings. The success of this conference was due to technical presentations and discussions of 224 participants from 14 countries as well as to financial support from many companies in Japan. On behalf of the committee, I wish to thank the authors for their excellent papers and the sponsors for their financial support. The International Committee responsible for advising this conference consisted of B.L. Crowder, J.A. Davies, G. Dearna1ey, F.H. Eisen, Ph. G1otin, T. Itoh, A.U. MacRae, J.W. Mayer, S. Namba, I. Ruge, and F.L. Vook.Taal: Engels;Afmetingen: 0x0 mm;Gewicht: 1,00 gram;Verschijningsdatum: april 1975;ISBN10: 030630841X;ISBN13: 9780306308413; Engelstalig | Hardcover | 1975.
bol.com.
The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third confer... The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This use of ion implantation is being adopted by industry. Another important application is the fundamental study of the physical properties of materials. The First Conference on Ion Implantation in Semiconductors was held at Thousand Oaks, California in 1970. The second conference in this series was held at Garmish-Partenkirchen, Germany, in 1971. At the third conference, which convened at Yorktown Heights, New York in 1973, the emphasis was broadened to include metals and insulators as well as semiconductors. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974. A huge number of papers had been submitted to this conference. All papers which were presented at the Fourth International Conference on Ion Implantation in Semiconductors and Other Materials are included in this proceedings. The success of this conference was due to technical presentations and discussions of 224 participants from 14 countries as well as to financial support from many companies in Japan. On behalf of the committee, I wish to thank the authors for their excellent papers and the sponsors for their financial support. The International Committee responsible for advising this conference consisted of B.L. Crowder, J.A. Davies, G. Dearna1ey, F.H. Eisen, Ph. G1otin, T. Itoh, A.U. MacRae, J.W. Mayer, S. Namba, I. Ruge, and F.L. Vook.Taal: Engels;Afmetingen: 0x0 mm;Gewicht: 1,00 gram;Verschijningsdatum: april 1975;ISBN10: 030630841X;ISBN13: 9780306308413; Engelstalig | Hardcover | 1975.
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Ion Implantation in Semiconductors: Science and Technology
EN US
ISBN: 9780306308413 bzw. 030630841X, in Englisch, Springer, gebraucht.
Lieferung aus: Vereinigte Staaten von Amerika, Versandkostenfrei nach: USA.
Von Händler/Antiquariat, Better World Books.
Springer. Used - Acceptable. Former Library book. Shows definite wear, and perhaps considerable marking on inside. 100% Money Back Guarantee. Shipped to over one million happy customers. Your purchase benefits world literacy!
Von Händler/Antiquariat, Better World Books.
Springer. Used - Acceptable. Former Library book. Shows definite wear, and perhaps considerable marking on inside. 100% Money Back Guarantee. Shipped to over one million happy customers. Your purchase benefits world literacy!
4
Ion Implantation in Semiconductors:Science and Technology (1975)
EN HC US
ISBN: 9780306308413 bzw. 030630841X, in Englisch, Springer, gebundenes Buch, gebraucht.
Lieferung aus: Vereinigtes Königreich Großbritannien und Nordirland, Versandkosten nach: USA.
Von Händler/Antiquariat, DSMBOOKS.
Springer , 1975. . Hardcover. Near Fine. Near Fine.
Von Händler/Antiquariat, DSMBOOKS.
Springer , 1975. . Hardcover. Near Fine. Near Fine.
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